TY  - GEN
AU  - Fang,Ming
AU  - Lin,Hao
AU  - Cheung,Ho-Yuen
AU  - Xiu,Fei
AU  - Shen,Lifan
AU  - Yip,SenPo
AU  - Pun,Edwin Yue-Bun
AU  - Wong,Chun-Yuen
AU  - Ho,Johnny C
TI  - Polymer-confined colloidal monolayer: a reusable soft photomask for rapid wafer-scale nanopatterning
SN  - 1944-8252
PY  - 2015///0331
N1  - Publication Type: Journal Article; Research Support, Non-U.S. Gov't
UR  - https://doi.org/10.1021/am505221g
ER  -