Fang, Ming <br/><br/>
Polymer-confined colloidal monolayer: a reusable soft photomask for rapid wafer-scale nanopatterning.  [electronic resource] 

 -  ACS applied materials & interfaces  Dec 2014 
 - 20837-41 p.  digital 
<br/><br/> Publication Type: Journal Article; Research Support, Non-U.S. Gov't 
<br/><br/><label>ISSN: </label>1944-8252 
<br/><br/><label>Standard No.: </label>10.1021/am505221g  doi