TY  - GEN
AU  - Kim,Bong Hoon
AU  - Byeon,Kyeong-Jae
AU  - Kim,Ju Young
AU  - Kim,Jinseung
AU  - Jin,Hyeong Min
AU  - Cho,Joong-Yeon
AU  - Jeong,Seong-Jun
AU  - Shin,Jonghwa
AU  - Lee,Heon
AU  - Kim,Sang Ouk
TI  - Negative-tone block copolymer lithography by in situ surface chemical modification
SN  - 1613-6829
PY  - 2015///0330
N1  - Publication Type: Journal Article; Research Support, Non-U.S. Gov't
UR  - https://doi.org/10.1002/smll.201400971
ER  -