Kim, Bong Hoon <br/><br/>
Negative-tone block copolymer lithography by in situ surface chemical modification.  [electronic resource] 

 -  Small (Weinheim an der Bergstrasse, Germany)  Oct 2014 
 - 4207-12 p.  digital 
<br/><br/> Publication Type: Journal Article; Research Support, Non-U.S. Gov't 
<br/><br/><label>ISSN: </label>1613-6829 
<br/><br/><label>Standard No.: </label>10.1002/smll.201400971  doi