TY  - GEN
AU  - Park,Seung-Gon
AU  - Woo,Hee-Gweon
AU  - Sunwoo,Changshin
AU  - Kim,Do-Heyoung
TI  - Electrical properties of Ta(Si)N films prepared by atomic layer deposition from tert-butylimido-tris-diethylamido tantalum, silane and hydrogen plasma
SN  - 1533-4880
PY  - 2013///0807
N1  - Publication Type: Journal Article
UR  - https://doi.org/10.1166/jnn.2013.7012
ER  -