Kolasinski, Kurt W <br/><br/>
The stoichiometry of electroless silicon etching in solutions of V2O5 and HF.  [electronic resource] 

 -  Angewandte Chemie (International ed. in English)  Jun 2013 
 - 6731-4 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>1521-3773 
<br/><br/><label>Standard No.: </label>10.1002/anie.201300755  doi