TY  - GEN
AU  - Alves,A D C
AU  - Newnham,J
AU  - van Donkelaar,J A
AU  - Rubanov,S
AU  - McCallum,J C
AU  - Jamieson,D N
TI  - Controlled deterministic implantation by nanostencil lithography at the limit of ion-aperture straggling
SN  - 1361-6528
PY  - 2013///0906
N1  - Publication Type: Journal Article; Research Support, Non-U.S. Gov't; Research Support, U.S. Gov't, Non-P.H.S
UR  - https://doi.org/10.1088/0957-4484/24/14/145304
ER  -