Alves, A D C <br/><br/>
Controlled deterministic implantation by nanostencil lithography at the limit of ion-aperture straggling.  [electronic resource] 

 -  Nanotechnology  Apr 2013 
 - 145304 p.  digital 
<br/><br/> Publication Type: Journal Article; Research Support, Non-U.S. Gov't; Research Support, U.S. Gov't, Non-P.H.S. 
<br/><br/><label>ISSN: </label>1361-6528 
<br/><br/><label>Standard No.: </label>10.1088/0957-4484/24/14/145304  doi