Chopra, Siddheshwar <br/><br/>
Hydrogen dependent surface morphology study of plasma deposited SiN(x):H films for two gas systems SiH4/NH3 and SiH4/N2.  [electronic resource] 

 -  Journal of nanoscience and nanotechnology  Dec 2011 
 - 11216-21 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>1533-4880 
<br/><br/><label>Standard No.: </label>10.1166/jnn.2011.4096  doi