Choi, Sungjin <br/><br/>
Reduced distribution of threshold voltage shift in double layer NiSi2 nanocrystals for nano-floating gate memory applications.  [electronic resource] 

 -  Journal of nanoscience and nanotechnology  Dec 2011 
 - 10553-6 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>1533-4880 
<br/><br/><label>Standard No.: </label>10.1166/jnn.2011.4009  doi