Choi, Sungwoo <br/><br/>
Development of a two-chamber process for self-assembling a fluorooctatrichlorosilane monolayer for the nanoimprinting of full-track nanopatterns with a 35 nm half pitch.  [electronic resource] 

 -  Journal of nanoscience and nanotechnology  Jul 2011 
 - 5921-7 p.  digital 
<br/><br/> Publication Type: Journal Article; Research Support, Non-U.S. Gov't 
<br/><br/><label>ISSN: </label>1533-4880 
<br/><br/><label>Standard No.: </label>10.1166/jnn.2011.4368  doi