Hellwig, Malte <br/><br/>
Atomic vapor deposition approach to In2O3 thin films.  [electronic resource] 

 -  Journal of nanoscience and nanotechnology  Sep 2011 
 - 8094-100 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>1533-4880 
<br/><br/><label>Standard No.: </label>10.1166/jnn.2011.5024  doi