Deshpande, Rajesh K <br/><br/>
Photolabile protecting groups in metal-organic frameworks: preventing interpenetration and masking functional groups.  [electronic resource] 

 -  Chemical communications (Cambridge, England)  Feb 2012 
 - 1574-6 p.  digital 
<br/><br/> Publication Type: Journal Article; Research Support, Non-U.S. Gov't 
<br/><br/><label>ISSN: </label>1364-548X 
<br/><br/><label>Standard No.: </label>10.1039/c1cc12884a  doi 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Crystallography, X-Ray<br/>Models, Molecular<br/>Nitrobenzenes--chemistry<br/>Organometallic Compounds--chemical synthesis<br/>Phenyl Ethers--chemistry<br/>Zinc--chemistry