Rademacher, Daniel <br/><br/>
In situ thickness determination of multilayered structures using single wavelength ellipsometry and reverse engineering.  [electronic resource] 

 -  Applied optics  Mar 2011 
 - C222-7 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>1539-4522 
<br/><br/><label>Standard No.: </label>10.1364/AO.50.00C222  doi