Voelkel, Reinhard <br/><br/>
Advanced mask aligner lithography: new illumination system.  [electronic resource] 

 -  Optics express  Sep 2010 
 - 20968-78 p.  digital 
<br/><br/> Publication Type: Journal Article; Research Support, Non-U.S. Gov't 
<br/><br/><label>ISSN: </label>1094-4087 
<br/><br/><label>Standard No.: </label>10.1364/OE.18.020968  doi