Attwood, D <br/><br/>
Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography.  [electronic resource] 

 -  Applied optics  Dec 1993 
 - 7022-31 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>1559-128X 
<br/><br/><label>Standard No.: </label>10.1364/AO.32.007022  doi