Meena, Jagan Singh <br/><br/>
Improved reliability from a plasma-assisted metal-insulator-metal capacitor comprising a high-k HfO2 film on a flexible polyimide substrate.  [electronic resource] 

 -  Physical chemistry chemical physics : PCCP  Mar 2010 
 - 2582-9 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>1463-9084 
<br/><br/><label>Standard No.: </label>10.1039/b917604g  doi