Elfström, D <br/><br/>
Mask-less ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes.  [electronic resource] 

 -  Optics express  Dec 2009 
 - 23522-9 p.  digital 
<br/><br/> Publication Type: Journal Article; Research Support, Non-U.S. Gov't 
<br/><br/><label>ISSN: </label>1094-4087 
<br/><br/><label>Standard No.: </label>10.1364/OE.17.023522  doi 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Computer-Aided Design<br/>Equipment Design<br/>Equipment Failure Analysis<br/>Lighting--instrumentation<br/>Manufactured Materials--radiation effects<br/>Miniaturization<br/>Photochemistry--instrumentation<br/>Photography--instrumentation<br/>Semiconductors<br/>Ultraviolet Rays