TY  - GEN
AU  - Gabel,K
AU  - Richardson,M
AU  - Kado,M
AU  - Vassiliev,A
TI  - Source characterization for x-ray proximity lithography
SN  - 0146-9592
PY  - 2012///1002
N1  - Publication Type: Journal Article
UR  - https://doi.org/10.1364/ol.19.002047
ER  -