Ichihara, Chikara <br/><br/>
Characterization of interface of Al-Ni/a-Si for thin film transistor using high-resolution Rutherford backscattering spectrometry.  [electronic resource] 

 -  Micron (Oxford, England : 1993)  Jan 2009 
 - 66-9 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>0968-4328 
<br/><br/><label>Standard No.: </label>10.1016/j.micron.2008.01.004  doi