Witzgall, G <br/><br/>
Single-shot two-photon exposure of commercial photoresist for the production of three-dimensional structures.  [electronic resource] 

 -  Optics letters  Nov 1998 
 - 1745-7 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>0146-9592 
<br/><br/><label>Standard No.: </label>10.1364/ol.23.001745  doi