Zhang, Hua <br/><br/>
High-throughput dip-pen-nanolithography-based fabrication of Si nanostructures.  [electronic resource] 

 -  Small (Weinheim an der Bergstrasse, Germany)  Jan 2007 
 - 81-5 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>1613-6829 
<br/><br/><label>Standard No.: </label>10.1002/smll.200600393  doi 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Crystallization--methods<br/>Ink<br/>Macromolecular Substances--chemistry<br/>Materials Testing<br/>Microscopy, Atomic Force--methods<br/>Molecular Conformation<br/>Nanostructures--chemistry<br/>Nanotechnology--methods<br/>Particle Size<br/>Silicon--chemistry<br/>Surface Properties