Montfort, Frédéric <br/><br/>
Purely numerical compensation for microscope objective phase curvature in digital holographic microscopy: influence of digital phase mask position.  [electronic resource] 

 -  Journal of the Optical Society of America. A, Optics, image science, and vision  Nov 2006 
 - 2944-53 p.  digital 
<br/><br/> Publication Type: Evaluation Study; Journal Article 
<br/><br/><label>ISSN: </label>1084-7529 
<br/><br/><label>Standard No.: </label>10.1364/josaa.23.002944  doi 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Algorithms<br/>Artifacts<br/>Holography--methods<br/>Image Enhancement--methods<br/>Image Interpretation, Computer-Assisted--methods<br/>Information Storage and Retrieval--methods<br/>Lenses<br/>Microscopy--methods<br/>Numerical Analysis, Computer-Assisted<br/>Reproducibility of Results<br/>Sensitivity and Specificity<br/>Signal Processing, Computer-Assisted