Chang, Chen <br/><br/>
Creation of line defects in holographic photonic crystals by a double-exposure thresholding method.  [electronic resource] 

 -  Applied optics  May 2005 
 - 2580-91 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>1559-128X 
<br/><br/><label>Standard No.: </label>10.1364/ao.44.002580  doi