APA

Coulon P., Damilano B., Alloing B., Chausse P., Walde S., Enslin J., Armstrong R., Vézian S., Hagedorn S., Wernicke T., Massies J., Zúñiga-Pérez J., Weyers M., Kneissl M. & Shields P. A. (2019). Displacement Talbot lithography for nano-engineering of III-nitride materials. : Microsystems & nanoengineering.

Chicago

Coulon Pierre-Marie, Damilano Benjamin, Alloing Blandine, Chausse Pierre, Walde Sebastian, Enslin Johannes, Armstrong Robert, Vézian Stéphane, Hagedorn Sylvia, Wernicke Tim, Massies Jean, Zúñiga-Pérez Jesus, Weyers Markus, Kneissl Michael and Shields Philip A. 2019. Displacement Talbot lithography for nano-engineering of III-nitride materials. : Microsystems & nanoengineering.

Harvard

Coulon P., Damilano B., Alloing B., Chausse P., Walde S., Enslin J., Armstrong R., Vézian S., Hagedorn S., Wernicke T., Massies J., Zúñiga-Pérez J., Weyers M., Kneissl M. and Shields P. A. (2019). Displacement Talbot lithography for nano-engineering of III-nitride materials. : Microsystems & nanoengineering.

MLA

Coulon Pierre-Marie, Damilano Benjamin, Alloing Blandine, Chausse Pierre, Walde Sebastian, Enslin Johannes, Armstrong Robert, Vézian Stéphane, Hagedorn Sylvia, Wernicke Tim, Massies Jean, Zúñiga-Pérez Jesus, Weyers Markus, Kneissl Michael and Shields Philip A. Displacement Talbot lithography for nano-engineering of III-nitride materials. : Microsystems & nanoengineering. 2019.