Growth and Characterization of Al2O3 Atomic Layer Deposition Films on sp(2)-Graphitic Carbon Substrates Using NO2/Trimethylaluminum Pretreatment. [electronic resource]

By: Contributor(s): Producer: 20150915Description: 12030-7 p. digitalISSN:
  • 1944-8252
Online resources: In: ACS applied materials & interfaces vol. 7
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Publication Type: Journal Article; Research Support, U.S. Gov't, Non-P.H.S.

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