APA

Pi T. W., Lin Y. H., Fanchiang Y. T., Chiang T. H., Wei C. H., Lin Y. C., Wertheim G. K., Kwo J. & Hong M. (20150825). In-situ atomic layer deposition of tri-methylaluminum and water on pristine single-crystal (In)GaAs surfaces: electronic and electric structures. : Nanotechnology.

Chicago

Pi T W, Lin Y H, Fanchiang Y T, Chiang T H, Wei C H, Lin Y C, Wertheim G K, Kwo J and Hong M. 20150825. In-situ atomic layer deposition of tri-methylaluminum and water on pristine single-crystal (In)GaAs surfaces: electronic and electric structures. : Nanotechnology.

Harvard

Pi T. W., Lin Y. H., Fanchiang Y. T., Chiang T. H., Wei C. H., Lin Y. C., Wertheim G. K., Kwo J. and Hong M. (20150825). In-situ atomic layer deposition of tri-methylaluminum and water on pristine single-crystal (In)GaAs surfaces: electronic and electric structures. : Nanotechnology.

MLA

Pi T W, Lin Y H, Fanchiang Y T, Chiang T H, Wei C H, Lin Y C, Wertheim G K, Kwo J and Hong M. In-situ atomic layer deposition of tri-methylaluminum and water on pristine single-crystal (In)GaAs surfaces: electronic and electric structures. : Nanotechnology. 20150825.