APA
McClain K. R., O'Donohue C., Koley A., Bonsu R. O., Abboud K. A., Revelli J. C., Anderson T. J. & McElwee-White L. (20140923). Tungsten nitrido complexes as precursors for low temperature chemical vapor deposition of WN(x)C(y) films as diffusion barriers for Cu metallization. : Journal of the American Chemical Society.
Chicago
McClain K Randall, O'Donohue Christopher, Koley Arijit, Bonsu Richard O, Abboud Khalil A, Revelli Joseph C, Anderson Timothy J and McElwee-White Lisa. 20140923. Tungsten nitrido complexes as precursors for low temperature chemical vapor deposition of WN(x)C(y) films as diffusion barriers for Cu metallization. : Journal of the American Chemical Society.
Harvard
McClain K. R., O'Donohue C., Koley A., Bonsu R. O., Abboud K. A., Revelli J. C., Anderson T. J. and McElwee-White L. (20140923). Tungsten nitrido complexes as precursors for low temperature chemical vapor deposition of WN(x)C(y) films as diffusion barriers for Cu metallization. : Journal of the American Chemical Society.
MLA
McClain K Randall, O'Donohue Christopher, Koley Arijit, Bonsu Richard O, Abboud Khalil A, Revelli Joseph C, Anderson Timothy J and McElwee-White Lisa. Tungsten nitrido complexes as precursors for low temperature chemical vapor deposition of WN(x)C(y) films as diffusion barriers for Cu metallization. : Journal of the American Chemical Society. 20140923.