Sub-100 nm Si nanowire and nano-sheet array formation by MacEtch using a non-lithographic InAs nanowire mask. [electronic resource]

By: Contributor(s): Producer: 20121105Description: 305305 p. digitalISSN:
  • 1361-6528
Online resources: In: Nanotechnology vol. 23
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Publication Type: Journal Article; Research Support, U.S. Gov't, Non-P.H.S.

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