APA

Schmucker S. W., Kumar N., Abelson J. R., Daly S. R., Girolami G. S., Bischof M. R., Jaeger D. L., Reidy R. F., Gorman B. P., Alexander J., Ballard J. B., Randall J. N. & Lyding J. W. (20121102). Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography. : Nature communications.

Chicago

Schmucker S W, Kumar N, Abelson J R, Daly S R, Girolami G S, Bischof M R, Jaeger D L, Reidy R F, Gorman B P, Alexander J, Ballard J B, Randall J N and Lyding J W. 20121102. Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography. : Nature communications.

Harvard

Schmucker S. W., Kumar N., Abelson J. R., Daly S. R., Girolami G. S., Bischof M. R., Jaeger D. L., Reidy R. F., Gorman B. P., Alexander J., Ballard J. B., Randall J. N. and Lyding J. W. (20121102). Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography. : Nature communications.

MLA

Schmucker S W, Kumar N, Abelson J R, Daly S R, Girolami G S, Bischof M R, Jaeger D L, Reidy R F, Gorman B P, Alexander J, Ballard J B, Randall J N and Lyding J W. Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography. : Nature communications. 20121102.