APA

Mejía M. I., Marín J. M., Restrepo G., Pulgarín C., Mielczarski E., Mielczarski J., Stolitchnov I. & Kiwi J. (20110822). Innovative UVC light (185 nm) and radio-frequency-plasma pretreatment of Nylon surfaces at atmospheric pressure and their implications in photocatalytic processes. : ACS applied materials & interfaces.

Chicago

Mejía M I, Marín J M, Restrepo G, Pulgarín C, Mielczarski E, Mielczarski J, Stolitchnov I and Kiwi J. 20110822. Innovative UVC light (185 nm) and radio-frequency-plasma pretreatment of Nylon surfaces at atmospheric pressure and their implications in photocatalytic processes. : ACS applied materials & interfaces.

Harvard

Mejía M. I., Marín J. M., Restrepo G., Pulgarín C., Mielczarski E., Mielczarski J., Stolitchnov I. and Kiwi J. (20110822). Innovative UVC light (185 nm) and radio-frequency-plasma pretreatment of Nylon surfaces at atmospheric pressure and their implications in photocatalytic processes. : ACS applied materials & interfaces.

MLA

Mejía M I, Marín J M, Restrepo G, Pulgarín C, Mielczarski E, Mielczarski J, Stolitchnov I and Kiwi J. Innovative UVC light (185 nm) and radio-frequency-plasma pretreatment of Nylon surfaces at atmospheric pressure and their implications in photocatalytic processes. : ACS applied materials & interfaces. 20110822.