APA

Elfström D., Guilhabert B., McKendry J., Poland S., Gong Z., Massoubre D., Richardson E., Rae B. R., Valentine G., Blanco-Gomez G., Gu E., Cooper J. M., Henderson R. K. & Dawson M. D. (20100317). Mask-less ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes. : Optics express.

Chicago

Elfström D, Guilhabert B, McKendry J, Poland S, Gong Z, Massoubre D, Richardson E, Rae B R, Valentine G, Blanco-Gomez G, Gu E, Cooper J M, Henderson R K and Dawson M D. 20100317. Mask-less ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes. : Optics express.

Harvard

Elfström D., Guilhabert B., McKendry J., Poland S., Gong Z., Massoubre D., Richardson E., Rae B. R., Valentine G., Blanco-Gomez G., Gu E., Cooper J. M., Henderson R. K. and Dawson M. D. (20100317). Mask-less ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes. : Optics express.

MLA

Elfström D, Guilhabert B, McKendry J, Poland S, Gong Z, Massoubre D, Richardson E, Rae B R, Valentine G, Blanco-Gomez G, Gu E, Cooper J M, Henderson R K and Dawson M D. Mask-less ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes. : Optics express. 20100317.