Graphene growth through a recrystallization process in plasma enhanced chemical vapor deposition. (Record no. 28777770)

MARC details
000 -LEADER
fixed length control field 00848 a2200253 4500
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20250517234212.0
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 201809s 0 0 eng d
022 ## - INTERNATIONAL STANDARD SERIAL NUMBER
International Standard Serial Number 1361-6528
024 7# - OTHER STANDARD IDENTIFIER
Standard number or code 10.1088/1361-6528/aadd74
Source of number or code doi
040 ## - CATALOGING SOURCE
Original cataloging agency NLM
Language of cataloging eng
Transcribing agency NLM
100 1# - MAIN ENTRY--PERSONAL NAME
Personal name Bekdüz, B
264 #0 - PRODUCTION, PUBLICATION, DISTRIBUTION, MANUFACTURE, AND COPYRIGHT NOTICE
Date of production, publication, distribution, manufacture, or copyright notice 20180917
245 00 - TITLE STATEMENT
Title Graphene growth through a recrystallization process in plasma enhanced chemical vapor deposition.
Medium [electronic resource]
260 ## - PUBLICATION, DISTRIBUTION, ETC.
Name of publisher, distributor, etc. Nanotechnology
Date of publication, distribution, etc. Nov 2018
300 ## - PHYSICAL DESCRIPTION
Extent 455603 p.
Other physical details digital
500 ## - GENERAL NOTE
General note Publication Type: Journal Article
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name Beckmann, Y
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name Mischke, J
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name Twellmann, J
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name Mertin, W
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name Bacher, G
773 0# - HOST ITEM ENTRY
Title Nanotechnology
Related parts vol. 29
-- no. 45
-- p. 455603
856 40 - ELECTRONIC LOCATION AND ACCESS
Uniform Resource Identifier <a href="https://doi.org/10.1088/1361-6528/aadd74">https://doi.org/10.1088/1361-6528/aadd74</a>
Public note Available from publisher's website

No items available.