Focused electron beam induced deposition of copper with high resolution and purity from aqueous solutions. (Record no. 26899633)

MARC details
000 -LEADER
fixed length control field 00798 a2200217 4500
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20250517141130.0
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 201807s 0 0 eng d
022 ## - INTERNATIONAL STANDARD SERIAL NUMBER
International Standard Serial Number 1361-6528
024 7# - OTHER STANDARD IDENTIFIER
Standard number or code 10.1088/1361-6528/aa5a4a
Source of number or code doi
040 ## - CATALOGING SOURCE
Original cataloging agency NLM
Language of cataloging eng
Transcribing agency NLM
100 1# - MAIN ENTRY--PERSONAL NAME
Personal name Esfandiarpour, Samaneh
264 #0 - PRODUCTION, PUBLICATION, DISTRIBUTION, MANUFACTURE, AND COPYRIGHT NOTICE
Date of production, publication, distribution, manufacture, or copyright notice 20180723
245 00 - TITLE STATEMENT
Title Focused electron beam induced deposition of copper with high resolution and purity from aqueous solutions.
Medium [electronic resource]
260 ## - PUBLICATION, DISTRIBUTION, ETC.
Name of publisher, distributor, etc. Nanotechnology
Date of publication, distribution, etc. Mar 2017
300 ## - PHYSICAL DESCRIPTION
Extent 125301 p.
Other physical details digital
500 ## - GENERAL NOTE
General note Publication Type: Journal Article
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name Boehme, Lindsay
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name Hastings, J Todd
773 0# - HOST ITEM ENTRY
Title Nanotechnology
Related parts vol. 28
-- no. 12
-- p. 125301
856 40 - ELECTRONIC LOCATION AND ACCESS
Uniform Resource Identifier <a href="https://doi.org/10.1088/1361-6528/aa5a4a">https://doi.org/10.1088/1361-6528/aa5a4a</a>
Public note Available from publisher's website

No items available.