Plasma-deposited fluoropolymer film mask for local porous silicon formation. (Record no. 21895618)

MARC details
000 -LEADER
fixed length control field 00809 a2200229 4500
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20250516100550.0
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 201210s 0 0 eng d
022 ## - INTERNATIONAL STANDARD SERIAL NUMBER
International Standard Serial Number 1556-276X
024 7# - OTHER STANDARD IDENTIFIER
Standard number or code 10.1186/1556-276X-7-344
Source of number or code doi
040 ## - CATALOGING SOURCE
Original cataloging agency NLM
Language of cataloging eng
Transcribing agency NLM
100 1# - MAIN ENTRY--PERSONAL NAME
Personal name Defforge, Thomas
264 #0 - PRODUCTION, PUBLICATION, DISTRIBUTION, MANUFACTURE, AND COPYRIGHT NOTICE
Date of production, publication, distribution, manufacture, or copyright notice 20121002
245 00 - TITLE STATEMENT
Title Plasma-deposited fluoropolymer film mask for local porous silicon formation.
Medium [electronic resource]
260 ## - PUBLICATION, DISTRIBUTION, ETC.
Name of publisher, distributor, etc. Nanoscale research letters
Date of publication, distribution, etc. Jun 2012
300 ## - PHYSICAL DESCRIPTION
Extent 344 p.
Other physical details digital
500 ## - GENERAL NOTE
General note Publication Type: Journal Article
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name Capelle, Marie
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name Tran-Van, François
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name Gautier, Gaël
773 0# - HOST ITEM ENTRY
Title Nanoscale research letters
Related parts vol. 7
-- no. 1
-- p. 344
856 40 - ELECTRONIC LOCATION AND ACCESS
Uniform Resource Identifier <a href="https://doi.org/10.1186/1556-276X-7-344">https://doi.org/10.1186/1556-276X-7-344</a>
Public note Available from publisher's website

No items available.