Hydrogen dependent surface morphology study of plasma deposited SiN(x):H films for two gas systems SiH4/NH3 and SiH4/N2. (Record no. 21614294)

MARC details
000 -LEADER
fixed length control field 00855 a2200217 4500
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20250516082605.0
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 201203s 0 0 eng d
022 ## - INTERNATIONAL STANDARD SERIAL NUMBER
International Standard Serial Number 1533-4880
024 7# - OTHER STANDARD IDENTIFIER
Standard number or code 10.1166/jnn.2011.4096
Source of number or code doi
040 ## - CATALOGING SOURCE
Original cataloging agency NLM
Language of cataloging eng
Transcribing agency NLM
100 1# - MAIN ENTRY--PERSONAL NAME
Personal name Chopra, Siddheshwar
264 #0 - PRODUCTION, PUBLICATION, DISTRIBUTION, MANUFACTURE, AND COPYRIGHT NOTICE
Date of production, publication, distribution, manufacture, or copyright notice 20120320
245 00 - TITLE STATEMENT
Title Hydrogen dependent surface morphology study of plasma deposited SiN(x):H films for two gas systems SiH4/NH3 and SiH4/N2.
Medium [electronic resource]
260 ## - PUBLICATION, DISTRIBUTION, ETC.
Name of publisher, distributor, etc. Journal of nanoscience and nanotechnology
Date of publication, distribution, etc. Dec 2011
300 ## - PHYSICAL DESCRIPTION
Extent 11216-21 p.
Other physical details digital
500 ## - GENERAL NOTE
General note Publication Type: Journal Article
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name Gupta, R P
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name Banerjee, Souri
773 0# - HOST ITEM ENTRY
Title Journal of nanoscience and nanotechnology
Related parts vol. 11
-- no. 12
-- p. 11216-21
856 40 - ELECTRONIC LOCATION AND ACCESS
Uniform Resource Identifier <a href="https://doi.org/10.1166/jnn.2011.4096">https://doi.org/10.1166/jnn.2011.4096</a>
Public note Available from publisher's website

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