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Characterization of silicon oxynitride films deposited by a high-power impulse magnetron sputtering deposition technique.

Liao, Bo-Huei

Characterization of silicon oxynitride films deposited by a high-power impulse magnetron sputtering deposition technique. [electronic resource] - Applied optics Feb 2020 - A176-A180 p. digital

Publication Type: Journal Article

ISSN: 1539-4522

Standard No.: 10.1364/AO.377983 doi

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