Normal view MARC view ISBD view

Selective Ru ALD as a Catalyst for Sub-Seven-Nanometer Bottom-Up Metal Interconnects.

Zyulkov, Ivan

Selective Ru ALD as a Catalyst for Sub-Seven-Nanometer Bottom-Up Metal Interconnects. [electronic resource] - ACS applied materials & interfaces Sep 2017 - 31031-31041 p. digital

Publication Type: Journal Article

ISSN: 1944-8252

Standard No.: 10.1021/acsami.7b07811 doi

Print
Cite
Add to your cart (remove)
Save record
BIBTEX Dublin Core MARCXML MARC (non-Unicode/MARC-8) MARC (Unicode/UTF-8) MARC (Unicode/UTF-8, Standard) MODS (XML) RIS ISBD
More searches

Search for this title in:
Other Libraries (WorldCat) Other Databases (Google Scholar) Online Stores (Bookfinder.com) Open Library (openlibrary.org)