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Characterizing fluorocarbon assisted atomic layer etching of Si using cyclic Ar/C

Metzler, Dominik

Characterizing fluorocarbon assisted atomic layer etching of Si using cyclic Ar/C [electronic resource] - The Journal of chemical physics Feb 2017 - 052801 p. digital

Publication Type: Journal Article

ISSN: 1089-7690

Standard No.: 10.1063/1.4961458 doi

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