APA

Wu C., Huang B., Chang K., Wang S., Lin J. & Hsu J. (20160822). The Performance Improvement of N2 Plasma Treatment on ZrO2 Gate Dielectric Thin-Film Transistors with Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition IGZO Channel. : Journal of nanoscience and nanotechnology.

Chicago

Wu Chien-Hung, Huang Bo-Wen, Chang Kow-Ming, Wang Shui-Jinn, Lin Jian-Hong and Hsu Jui-Mei. 20160822. The Performance Improvement of N2 Plasma Treatment on ZrO2 Gate Dielectric Thin-Film Transistors with Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition IGZO Channel. : Journal of nanoscience and nanotechnology.

Harvard

Wu C., Huang B., Chang K., Wang S., Lin J. and Hsu J. (20160822). The Performance Improvement of N2 Plasma Treatment on ZrO2 Gate Dielectric Thin-Film Transistors with Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition IGZO Channel. : Journal of nanoscience and nanotechnology.

MLA

Wu Chien-Hung, Huang Bo-Wen, Chang Kow-Ming, Wang Shui-Jinn, Lin Jian-Hong and Hsu Jui-Mei. The Performance Improvement of N2 Plasma Treatment on ZrO2 Gate Dielectric Thin-Film Transistors with Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition IGZO Channel. : Journal of nanoscience and nanotechnology. 20160822.