Ge microdisk with lithographically-tunable strain using CMOS-compatible process.
Sukhdeo, David S
Ge microdisk with lithographically-tunable strain using CMOS-compatible process. [electronic resource] - Optics express Dec 2015 - 33249-54 p. digital
Publication Type: Journal Article; Research Support, Non-U.S. Gov't; Research Support, U.S. Gov't, Non-P.H.S.
1094-4087
10.1364/OE.23.033249 doi
Ge microdisk with lithographically-tunable strain using CMOS-compatible process. [electronic resource] - Optics express Dec 2015 - 33249-54 p. digital
Publication Type: Journal Article; Research Support, Non-U.S. Gov't; Research Support, U.S. Gov't, Non-P.H.S.
1094-4087
10.1364/OE.23.033249 doi