Polymer-confined colloidal monolayer: a reusable soft photomask for rapid wafer-scale nanopatterning.
Fang, Ming
Polymer-confined colloidal monolayer: a reusable soft photomask for rapid wafer-scale nanopatterning. [electronic resource] - ACS applied materials & interfaces Dec 2014 - 20837-41 p. digital
Publication Type: Journal Article; Research Support, Non-U.S. Gov't
1944-8252
10.1021/am505221g doi
Polymer-confined colloidal monolayer: a reusable soft photomask for rapid wafer-scale nanopatterning. [electronic resource] - ACS applied materials & interfaces Dec 2014 - 20837-41 p. digital
Publication Type: Journal Article; Research Support, Non-U.S. Gov't
1944-8252
10.1021/am505221g doi