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Low-temperature water gas shift reaction on Cu/SiO2 prepared by an atomic layer epitaxy technique.

Chen, Ching-Shiun

Low-temperature water gas shift reaction on Cu/SiO2 prepared by an atomic layer epitaxy technique. [electronic resource] - Chemical communications (Cambridge, England) Oct 2008 - 4983-5 p. digital

Publication Type: Journal Article

ISSN: 1359-7345

Standard No.: 10.1039/b807428c doi

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