Overall reaction mechanism for a full atomic layer deposition cycle of W films on TiN surfaces: first-principles study.

Name: Overall reaction mechanism for a full atomic layer deposition cycle of W films on TiN surfaces: first-principles study.
Author: Park, Hwanyeol

Overall reaction mechanism for a full atomic layer deposition cycle of W films on TiN surfaces: first-principles study. — المؤلف: Park, Hwanyeol — RSC advances Nov 2018

المؤلف: Park, Hwanyeol
النشر: RSC advances Nov 2018
الوصف: 39039-39046 p.