Drain Current Model for Double Gate Tunnel-FETs with InAs/Si Heterojunction and Source-Pocket Architecture.
Drain Current Model for Double Gate Tunnel-FETs with InAs/Si Heterojunction and Source-Pocket Architecture. — المؤلف: Lu, Hongliang — Nanomaterials (Basel, Switzerland) Feb 2019
- المؤلف
- Lu, Hongliang
- النشر
- Nanomaterials (Basel, Switzerland) Feb 2019