Drain Current Model for Double Gate Tunnel-FETs with InAs/Si Heterojunction and Source-Pocket Architecture.

Drain Current Model for Double Gate Tunnel-FETs with InAs/Si Heterojunction and Source-Pocket Architecture. — المؤلف: Lu, Hongliang — Nanomaterials (Basel, Switzerland) Feb 2019

المؤلف
Lu, Hongliang
النشر
Nanomaterials (Basel, Switzerland) Feb 2019