Effect of the SiCl₄ Flow Rate on SiBN Deposition Kinetics in SiCl₄-BCl₃-NH₃-H₂-Ar Environment.

Name: Effect of the SiCl₄ Flow Rate on SiBN Deposition Kinetics in SiCl₄-BCl₃-NH₃-H₂-Ar Environment.
Author: Li, Jianping

Effect of the SiCl₄ Flow Rate on SiBN Deposition Kinetics in SiCl₄-BCl₃-NH₃-H₂-Ar Environment. — المؤلف: Li, Jianping — Materials (Basel, Switzerland) Jun 2017

المؤلف: Li, Jianping
النشر: Materials (Basel, Switzerland) Jun 2017