APA

Bachmann J., Zierold R., Chong Y. T., Hauert R., Sturm C., Schmidt-Grund R., Rheinländer B., Grundmann M., Gösele U. & Nielsch K. (20080916). A practical, self-catalytic, atomic layer deposition of silicon dioxide. : Angewandte Chemie (International ed. in English).

Chicago

Bachmann Julien, Zierold Robert, Chong Yuen Tung, Hauert Roland, Sturm Chris, Schmidt-Grund Rüdiger, Rheinländer Bernd, Grundmann Marius, Gösele Ulrich and Nielsch Kornelius. 20080916. A practical, self-catalytic, atomic layer deposition of silicon dioxide. : Angewandte Chemie (International ed. in English).

Harvard

Bachmann J., Zierold R., Chong Y. T., Hauert R., Sturm C., Schmidt-Grund R., Rheinländer B., Grundmann M., Gösele U. and Nielsch K. (20080916). A practical, self-catalytic, atomic layer deposition of silicon dioxide. : Angewandte Chemie (International ed. in English).

MLA

Bachmann Julien, Zierold Robert, Chong Yuen Tung, Hauert Roland, Sturm Chris, Schmidt-Grund Rüdiger, Rheinländer Bernd, Grundmann Marius, Gösele Ulrich and Nielsch Kornelius. A practical, self-catalytic, atomic layer deposition of silicon dioxide. : Angewandte Chemie (International ed. in English). 20080916.