Human serum albumin adsorption onto a-SiC:H and a-C:H thin films deposited by plasma enhanced chemical vapor deposition. [electronic resource]

By: Contributor(s): Producer: 20030307Description: 85-90 p. digitalISSN:
  • 1389-0344
Subject(s): Online resources: In: Biomolecular engineering vol. 19
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Publication Type: Comparative Study; Evaluation Study; Journal Article; Research Support, Non-U.S. Gov't

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